Dynamics of a pulsed DC discharge used for plasma-assisted chemical vapor deposition — a case study for titanium nitride deposition
作者： T.A. Beer , J. Laimer , H. Störi
DOI: 10.1016/S0257-8972(99)00486-7
关键词: Cathode 、 Materials science 、 Chemical vapor deposition 、 Plasma 、 Dielectric barrier discharge 、 Optoelectronics 、 Langmuir probe 、 Titanium nitride 、 Pulsed DC 、 Analytical chemistry 、 Light emission
摘要: Abstract An investigation of the development a pulsed DC discharge used for plasma-assisted chemical vapor deposition (PACVD) titanium nitride was carried out in order to understand non-uniform depositions larger PACVD systems. The temporal and spatial evolution plasma light emission studied by video camera. time potential single Langmuir probe current probe. In presence TiCl 4 formation across reactor is slow, reaching some parts with substantial delay. Our experiments show that depends on geometry cathode, which includes loading placement substrates, gas mixture waveform voltage supplied. slow spreading surface substrates are placed, leads non-uniformity power density front cathode as well spatially varying exposure plasma. revealed can be solved measures provide sufficient fall entire whereby high average currents have avoided.
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