Step Coverage in ALD

作者: Sovan Kumar Panda , Hyunjung Shin

DOI: 10.1002/9783527639915.CH2

关键词: Atomic layer depositionOptoelectronicsSticking probabilityNanotechnologyMaterials scienceAspect ratio

摘要:

参考文章(40)
G. Radhakrishnan, R.E. Robertson, R.C. Cole, P.M. Adams, Hybrid pulsed laser deposition and Si-surface-micromachining process for integrated TiC coatings in moving MEMS Applied Physics A. ,vol. 77, pp. 175- 184 ,(2003) , 10.1007/S00339-003-2138-0
Timothy S. Cale, David F. Richards, Daewon Yang, Opportunities for materials modeling in microelectronics: Programmed rate chemical vapor deposition Journal of Computer-aided Materials Design. ,vol. 6, pp. 283- 309 ,(1999) , 10.1023/A:1008762530690
S. Haukka, A. Kytökivi, E-L. Lakomaa, U. Lehtovirta, M. Lindblad, V. Lujala, T. Suntola, The utilization of saturated gas-solid reactions in the preparation of heterogeneous catalysts Studies in Surface Science and Catalysis. ,vol. 91, pp. 957- 966 ,(1995) , 10.1016/S0167-2991(06)81839-2
Young-Hoon Shin, Yukihiro Shimogaki, Diffusion barrier property of TiN and TiN/Al/TiN films deposited with FMCVD for Cu interconnection in ULSI Science and Technology of Advanced Materials. ,vol. 5, pp. 399- 405 ,(2004) , 10.1016/J.STAM.2004.02.001
Donald S. Taylor, Manoj K. Jain, Timothy S. Cale, Deposition rate dependence of step coverage of sputter deposited aluminum-(1.5%) copper films Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 16, pp. 3123- 3126 ,(1998) , 10.1116/1.581476
Gregory B. Raupp, T. S. Cale, Step coverage prediction in low-pressure chemical vapor deposition Chemistry of Materials. ,vol. 1, pp. 207- 214 ,(1989) , 10.1021/CM00002A009
Ja-Yong Kim, Jin-Hyock Kim, Ji-Hoon Ahn, Pan-Kwi Park, Sang-Won Kang, Applicability of Step-Coverage Modeling to TiO2 Thin Films in Atomic Layer Deposition Journal of The Electrochemical Society. ,vol. 154, ,(2007) , 10.1149/1.2789802
J. W. Elam, D. Routkevitch, P. P. Mardilovich, S. M. George, Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition Chemistry of Materials. ,vol. 15, pp. 3507- 3517 ,(2003) , 10.1021/CM0303080
B. S. Berland, I. P. Gartland, A. W. Ott, S. M. George, In situ monitoring of atomic layer controlled pore reduction in alumina tubular membranes using sequential surface reactions Chemistry of Materials. ,vol. 10, pp. 3941- 3950 ,(1998) , 10.1021/CM980384G