Forced flow atomic layer deposition of TiO2 on vertically aligned Si wafer and polysulfone fiber: Design and efficacy of conduit plates and soak function.
作者： Mrinalini Mishra , Chia-Yen Chan , Chi-Chung Kei , Yin-Cheng Yen , Ming-Wei Liao
DOI: 10.1063/1.5043476
关键词:
摘要: The effectiveness of three different designs conduit plates was verified for even distribution precursors in a voluminous forced-flow atomic layer deposition (ALD) chamber designed to hold macroscopic elongated substrates vertically. Furthermore, new "soak function" introduced the controlling software ALD instrument. This function enabled increase residence time precursor without escalating dosage. flow guided by with and application soak simulated using computational fluid dynamics. A conformal coating TiO2 good uniformity on Si porous polysulfone fibers achieved evidence design efficacy function.
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