Chapter 4 MOS Transistors

作者: Marvin H. White

DOI: 10.1016/S0080-8784(08)63009-4

关键词: SemiconductorAmplifierElectronic circuitFabricationGeneral theoryMathematical developmentOptoelectronicsCapacitorMaterials scienceTransistorNanotechnology

摘要: Publisher Summary This chapter discusses the metal–oxide–semiconductor (MOS) capacitor, transistor and their circuits. The theory of voltage-dependent MOS capacitor operating under various modes accumulation, depletion, or inversion semiconductor surface is described. It suggested that mathematical development general related to operation MOS- field-effect (FET) structure. Fabrication experimental determination C-V characteristics are discussed in terms a representative fabrication process. Then device evaluation n- p -channel MOS-FET for process presented. small-signal amplifier switching also discussed. application n enhancement-mode digital switching-type circuits

参考文章(83)
J. Torkel Wallmark, Hardwick Johnson, Field-effect transistors : physics, technology and applications Prentice-Hall. ,(1966)
Peter V. Gray, Dale M. Brown, DENSITY OF SiO2–Si INTERFACE STATES Applied Physics Letters. ,vol. 8, pp. 31- 33 ,(1966) , 10.1063/1.1754468
K. H. Zaininger, A. G. Revesz, INFLUENCE OF OXIDATION RATE AND HEAT TREATMENT ON THE DENSITY OF SURFACE STATES IN THE Si–SiO2SYSTEM Applied Physics Letters. ,vol. 7, pp. 108- 110 ,(1965) , 10.1063/1.1754312
G. Cheroff, F. Fang, F. Hochberg, Effect of low temperature annealing on the surface conductivity of Si in the Si-SiO 2 -AI system Ibm Journal of Research and Development. ,vol. 8, pp. 416- 421 ,(1964) , 10.1147/RD.84.0416
Robert H. Kingston, Siegfried F. Neustadter, Calculation of the Space Charge, Electric Field, and Free Carrier Concentration at the Surface of a Semiconductor Journal of Applied Physics. ,vol. 26, pp. 718- 720 ,(1955) , 10.1063/1.1722077
Thomas J. O'Reilly, The transient response of insulated-gate field-effect transistors☆ Solid-state Electronics. ,vol. 8, pp. 947- 956 ,(1965) , 10.1016/0038-1101(65)90159-0
M.H. White, R.C. Gallagher, Metal-oxide-semiconductor (MOS) small signal equivalent circuit Proceedings of the IEEE. ,vol. 53, pp. 314- 315 ,(1965) , 10.1109/PROC.1965.3712
Y. Miura, S. Tanako, Y. Matukura, H. Osafune, Silicon Dioxide Films Doped with Phosphorus Journal of The Electrochemical Society. ,vol. 113, pp. 399- 401 ,(1966) , 10.1149/1.2423974