Projection objection for microlithography
作者： Karl-Heinz Schuster
DOI:
关键词: Mathematics 、 Lens (geology) 、 Optics 、 Projection lens 、 Projection (mathematics) 、 Light beam
摘要: The invention relates to a projection lens comprising assembly that has at least one first narrowing of the group light beams. A with non-spherical surface is located in front and/or behind narrowing.
lens.org 参考文章(1)
Koji Shigematsu, Projection optical system and exposure apparatus and method ,(1999)