Water surface coverage effects on reactivity of plasma oxidized Ti films

摘要: Abstract The behavior of the adsorbed water on surface thin sputter deposited Ti films maintained at room temperature was investigated in dependence thickness resulting layer, controllably injecting vapor into plasma. morphology and microstructure were used to characterize surfaces plasma treated titanium films. Presented experimental results showed that immersed pressure 10–100 Pa promoted photocatalytic activity overall splitting. oxidized covered by an hydroxyl-rich island structure layer activated radiation became highly chemically reactive. As increased up 300–500 Pa, formed multilayer diminished oxidation and, consequently, splitting efficiency decreased. Analysis gave important insights role exposed its chemical electrochemical processes, elucidated reactions could lead split molecules.