Ultrashort pulse laser deposition of thin films

摘要: Short pulse PLD is a viable technique of producing high quality films with properties very close to that crystalline diamond. The plasma generated using femtosecond lasers composed single atom ions no clusters Sp3/Sp2 ratios. Using average power laser system, the present invention dramatically increases deposition rates up 25 μm/hr (which exceeds many CVD processes) while growing particulate-free films. In invention, function wavelength, fluence, spot size, and target/substrate separation. relevant parameters are shown ensure growth, characterizations grown made several diagnostic techniques including electron energy loss spectroscopy (EELS) Raman spectroscopy.