Accurate Doping Profile Extraction Near the Si/SiO2 Interface with a Novel Low Temperature C-V Technique

作者: A. Pirovano , A.L. Lacaita , A. Pacelli , A. Benvenuti

DOI: 10.1109/ESSDERC.2000.194790

关键词: VoltageDoping profileAnalytical chemistryDifferential capacitanceImage resolutionCapacitanceInterface (computing)Materials scienceInverse problemExtraction (chemistry)

摘要:

参考文章(6)
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