The influence of debye length on the C-V measurement of doping profiles

作者: W.C. Johnson , P.T. Panousis

DOI: 10.1109/T-ED.1971.17311

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摘要: The doping profile of a semiconductor is given only approximately by the conventional analysis C-V measurements. present study employs computer simulation semiconductors with one-sided profiles that consist high and low doped sections joined steps linear ramps. computation yields apparent would be obtained use data, this result compared actual profile, majority-carrier distribution, outcome correction previously proposed in literature. results show step cannot resolved satisfactorily to less than several Debye lengths corresponding on side profile. A ramp distinguished accurately from unless its width appreciably greater length. Furthermore, not identical distribution contacts far away, as has been suggested, discrepancy shown depend which depletion done.

参考文章(3)
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