作者: Wenhe Feng , Ju Nie Tey , Yin Chi Wan , Xuechuan Shan , Hongyu Zheng
DOI: 10.1016/J.JMAPRO.2019.01.036
关键词: Telecentric lens 、 Laser 、 Fiber laser 、 Electrode 、 Materials science 、 Laser ablation 、 Raster scan 、 Electroluminescence 、 Optoelectronics 、 Layer (electronics)
摘要: Abstract We propose a method to use laser pattern 6.6 μm-thick Ag back electrode layer on electroluminescence (EL) film electrically isolate designated regions towards the functionality of selective lighting. The processing system employs 20 W, 1064 nm wavelength, nanosecond-pulsed, master oscillator power amplifier (MOPA) fibre as source. A dynamic focusing configuration is adopted replacement conventional telecentric lens setup for beam and delivery, with focal spot size 33 μm speed high 3 m/s. effects parameters ablated channel width, depth, quality, elemental composition electrical isolation are investigated. It found that higher deposited energy causes kerf width well reproducibility increase, at cost increased chance damage surrounding substrate layer. Based findings, recipe established by producing channels narrow (41.3 ± 0.8) μm without introducing collateral film. Using selected parameter combinations from window, uniformity ablation over 300 × 200 mm2 scanning area examined. Finally, using raster method, lighting 295 × 180 demonstrated.