作者: J. C. Duda , C.-Y. P. Yang , B. M. Foley , R. Cheaito , D. L. Medlin
DOI: 10.1063/1.4793431
关键词: Conductance 、 Nanotechnology 、 Interfacial thermal resistance 、 Composite material 、 Electrical contacts 、 Silicon 、 Materials science 、 Layer (electronics) 、 Deposition (law) 、 Adhesion 、 Oxide
摘要: We measure the Kapitza conductances at Au:Si contacts from 100 to 296 K via time-domain thermoreflectance. Contacts are fabricated by evaporating Au films onto Si substrates. Prior deposition, substrates receive pretreatments in order modify interfacial properties, i.e., bonding and structural disorder. Through inclusion of a Ti adhesion layer removal native oxide, conductance can be enhanced factor four 296 K. Furthermore, roughness is found have negligible effect, which we attribute already low poorly bonded contacts.