Film deposition apparatus and film deposition method
作者： Shinji Kiyofuji , 真次 清藤
DOI:
关键词: Substrate (printing) 、 Materials science 、 Perpendicular 、 Optoelectronics 、 Edge (geometry) 、 Deflection (engineering) 、 Deposition (phase transition) 、 Plane (geometry)
摘要: PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of correcting deflection and positional deviation flexible substrate to be conveyed vertically in perpendicular plane while suppressing occurrence wrinkles. SOLUTION: A web edge guide device 21 for adjusting the advancing direction 1 is arranged on downstream side chambers 6a, 6b,,, 6n. The adjusts by turning over entire width along surface orthogonal 1. COPYRIGHT: (C)2008,JPO&INPIT
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