作者: Meesoon Ha
DOI: 10.1016/J.PHPRO.2012.05.007
关键词: Context (language use) 、 Chemical vapor deposition 、 Kinetic energy 、 Noise (electronics) 、 Scaling 、 Molecular physics 、 Flux 、 Nanotechnology 、 Deposition (phase transition) 、 Materials science 、 Correlation function (statistical mechanics)
摘要: Abstract Kinetic roughening is revisited in the context of polymer thin film growth by vapor deposition using simplest toy model chemical polymerization (CVDP) growth, which was employed [J. Stat. Mech. (2009) P02031]. As ratio monomer di_usion rate D to flux F monomers (G = D=F) increases, dynamic scaling CVDP investigated (1+1) and (2+1) dimensions. Measuring surface width (height fluctuations) q-th order moments height-height correlation function, it observed that anomalous behavior multifractality exist. In speculate origin such anomalies, following two scenarios are suggested tested: One cosine incident (random angle deposition) essential kinetic phenomena other multi-a_ne structure growing surfaces attributed non-local shadowing e_ect caused monomers, yields power-law distribution steps. Based on comparison ballistic with some modification noise, namely numerically confirmed turn be true. This implies depends not only what value used for (G) but also kind intrinsic extrinsic noise exists.