Method of extracting defects
作者： Chih-Ming Ke , Jia-Rui Hu , Shu-Chuan Chuang , Che-Yuan Sun
DOI:
关键词: Substrate (electronics) 、 Optoelectronics 、 Materials science
摘要: A method provides a design layout having pattern of features. The is transferred onto substrate on semiconductor using mask. scanning parameter determined based the layout. An image generated parameter. defect identified by comparing first number closed curves in region and second polygons corresponding
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