Early stages in the self-organization of Si nanopatterns induced by ion bombardment.

摘要: We reveal early stages of self-organization nanopatterns created by 2 keV Cs+ ion-beam irradiation a Si surface coated with Au and Ti adhesion layer. After etching the metallic layers, at normal incidence, we first observe distinct transient stages: (I) dewetting-like pattern grooves in amorphized layer, sparsely populated holes, followed (II) coexistence rounded mounds faceted holes distributed on flat surface, latter being an indication decisive role played crystalline/amorphous interface. Subsequently, system evolves to stage III, nanopattern densely packed nanodots convoluted long-wavelength corrugation. A momentum-space analysis shows that are identified, respectively, channel-type sphere-type quasi order.