Characteristics of electron‐beam‐excited Xe*2 at low pressures as a vacuum ultraviolet source
作者： D. J. Eckstrom , H. H. Nakano , D. C. Lorents , T. Rothem , J. A. Betts
DOI: 10.1063/1.342474
关键词: Xenon 、 Cathode ray 、 Excited state 、 Gas laser 、 Secondary electrons 、 Krypton 、 Chemistry 、 Laser 、 Photoionization 、 Atomic physics
摘要: The performance of Xe*2 as a 172‐nm fluorescence or laser source when pumped by low‐current, long‐pulse electron beam was determined. efficiency is near the theoretical limit ∼50% at modest pressures over range pump rates up to 106 W/cm. limited values <1% very strong medium absorption that probably due photoionization. Laser further degraded early pulse termination appears related mirror degradation. An improved kinetics and extraction code developed model system. A key component more detailed treatment interactions between secondary electrons excited atomic molecular xenon states. Rates for these processes were derived described herein. With this model, good absolute agreement obtained experiments calculated parameters low 0.5 atm.
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