作者: F.A. Trumbore , C.R. Isenberg , E.M. Porbansky
DOI: 10.1016/0022-3697(59)90091-5
关键词: Tin 、 Silicon 、 Thermodynamics 、 Melting point 、 Binding energy 、 Chemistry 、 Work (thermodynamics) 、 Germanium 、 Crystallization 、 Crystallography 、 Partition coefficient
摘要: Abstract The solid solubility of tin in silicon has been determined the range from 800°C to melting point silicon, using crystal-pulling and thermal-gradient crystallization techniques. distribution coefficient, k , falls 0.016 at about 6.5 × 10 −4 800°C. Earlier work on tin-germanium system also extended. form temperature-dependence is similar for both systems does not fit into correlation recently proposed by Hall ( J. Phys. Chem. Solids 3 63 (1957)). For these two observed can be explained as being due a large measure departures ideality liquid state. Binding energies germanium calculated solid-solubility data compare favorably with binding Allen 's reciprocal mean postulate covalent bond (J. 27, 810