System for measuring optical admittance of a thin film stack
作者： Sheng-Hui Chen , Kai Wu , Chien-Cheng Kuo , Sheng-Ju Ma , Cheng-Chung Lee
DOI: 10.1007/S10043-009-0093-5
关键词: Optics 、 Polarizer 、 Thin film 、 Interferometry 、 Ellipsometry 、 Refractive index 、 Optical polarization 、 Fizeau interferometer 、 Materials science 、 Polarization (waves) 、 Atomic and Molecular Physics, and Optics
摘要: A new method based on the polarization interferometer structure has been applied to measure optical admittance, refractive index and thickness of a thin film. The is vibration insensitive system. There one Twyman-Green part induce phase difference Fizeau interference in intensities coming from four different polarizers were measured at same time prevent mechanical influence. Using interferometer, single layer Ta2O5 film measured. measurement results compared with obtained by ellipsometer. meet reasonable values both thickness.
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