Surface observation apparatus and surface observation method

作者: Naoma Ban , Takehiro Hirai , Kenji Obara

DOI:

关键词: Artificial intelligenceImage processingCorrelation coefficientValue (computer science)Surface (mathematics)Observation methodMathematicsImage (mathematics)Absolute value (algebra)Computer vision

摘要: A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns be evaluated without trial and error approach. plurality images are input from image processing unit ( 114 ) 113 (in step 901 ). The displayed on display 115 user rearranges the in accordance with criterion while referencing ), defines 902 Evaluation values calculated (to evaluated) using indicators 903 compared defined by user, correlation coefficients then 904 An having maximum absolute value coefficient automatically selected as that closest 905 rearranged order list so arranged 906

参考文章(19)
Masahiro Watanabe, Kaoru Sakai, Takafumi Okabe, Shunji Maeda, Method and apparatus for inspecting defects ,(2009)
Hidetoshi Nishiyama, Takafumi Okabe, Yukihiro Shibata, Shunji Maeda, Method of inspecting defects ,(2004)
Hisae Shibuya, Shunji Maeda, Akira Hamamatsu, Defect classification method and apparatus, and defect inspection apparatus ,(2007)
Hiroshi Goto, Kaoru Sakai, Takafumi Okabe, Masayuki Kuwabara, Naoya Takeuchi, Shunji Maeda, Pattern inspection method and its apparatus ,(2007)
David L. Adler, Mark Mccord, Stuart Friedman, Kirk Bertsche, Method and apparatus for inspecting a substrate ,(2001)
Ryo Nakagaki, Toshiei Kurosaki, Seiji Isogai, Yuji Takagi, Kenji Obara, Yasuhiro Ozawa, Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus ,(2006)