Pattern inspection method and its apparatus
作者： Hiroshi Goto , Kaoru Sakai , Takafumi Okabe , Masayuki Kuwabara , Naoya Takeuchi
DOI:
关键词: Inspection method 、 Image (mathematics) 、 Brightness 、 Computer vision 、 Highly sensitive 、 Gradation 、 Automated X-ray inspection 、 Image signal 、 Computer science 、 Plural 、 Artificial intelligence
摘要: In a pattern inspection apparatus for comparing images of corresponding areas two patterns, which are formed so as to be identical, judge that non-coincident part the is defect, influence unevenness in brightness patterns caused by difference thickness or like reduced, whereby highly sensitive realized. addition, high-speed can carried out without changing image comparison algorithm. For this purpose, operates perform processing parallel plural areas. Further, convert gradation an signal among compared using different units such that, even case occurs identical images, defect detected correctly.
google.de 参考文章(47)
Masahiro Watanabe, Kaoru Sakai, Takafumi Okabe, Shunji Maeda, Method and apparatus for inspecting defects ,(2009)
Toshihiko Tanaka, Tsuneo Terasawa, Norio Hasegawa, Method of manufacturing a photomask ,(2001)
Hiroshi Makihira, Takashi Hiroi, Hitoshi Kubota, Shunji Maeda, Pattern checking method and checking apparatus ,(1992)
Justin E. Harlow, Kenneth A. Ports, Method of serialization of dice ,(1980)
Kaoru Sakai, Takafumi Okabe, Shunji Maeda, Method and apparatus for inspecting pattern defects ,(2002)
Georgi Hristoff Draganoff, Segmented sliding yardsticks error tolerant fingerprint enrollment and verification system and method ,(1998)
Hideaki Doi, Chie Shishido, Takashi Hiroi, Masahiro Watanabe, Yuji Takagi, Takanori Ninomiya, Shuji Maeda, Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof ,(2003)
Kaoru Sakai, Takafumi Okabe, Shunji Maeda, Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections ,(2006)
Hidetoshi Nishiyama, Tetsuya Watanabe, Minori Noguchi, Takanori Ninomiya, Yoshimasa Ohshima, Yoshio Morishige, Kenji Watanabe, Akira Hamamatsu, Kenji Oka, Maki Tanaka, Method of inspecting a semiconductor device and an apparatus thereof ,(2006)
Ryuichi Funatsu, Hiroshi Miyai, Yasuhiko Nara, Taku Ninomiya, Inspection method and apparatus using an electron beam ,(2003)