Roles of Transients and Nucleation in Film Deposition within a Support

摘要: The deposition of films within a porous substrate is modeled in countercurrent reactor configuration. Two transient models are solved:  diffusion−one-step reaction chemistry model and diffusion−four-step that incorporates precursor formation followed by nucleation growth events. It shown the quasi-steady-state/infinitely fast assumptions employed diffusion-reaction not valid either slow or kinetics regime due to evolution deposit. results continuous deposits, which relatively thick. interplay with diffusion can result quite thinner deposits. demonstrated strong dependence features on initial conditions provides an additional means controlling one hand but indicates possible reduced experimental reproducibility other. Application Pd membranes alumina under supercritical CO2 conditi...