Fe/NiO(100) and Fe/MgO(100) interfaces studied by X-ray absorption spectroscopy and non-linear Kerr effect
作者： S. Colonna , A. Cricenti , P. Luches , S. Valeri , F. Boscherini
DOI: 10.1016/J.SPMI.2009.01.013
关键词: Substrate (electronics) 、 Kerr effect 、 X-ray absorption spectroscopy 、 Epitaxy 、 Non-blocking I/O 、 Materials science 、 Tetragonal crystal system 、 Nuclear magnetic resonance 、 Analytical chemistry 、 Absorption spectroscopy 、 Layer (electronics)
摘要: Abstract A structural characterization of the Fe/NiO(100) and Fe/MgO(100) interfaces is reported. Polarization-dependent X-ray absorption spectroscopy has been employed to explore local atomic structure interfaces. strong difference between two systems observed: interface does not show a significant Fe oxidation or oxygen diffusion while buckled Fe–O like layer observed at Fe/NiO(001). Moreover, on MgO(001) substrate tetragonal strain released 10 ML thickness, residual epitaxial can be film same thickness NiO(001). magnetic Fe/NiO(001) system by linear non-linear magneto-optical Kerr effect measurements also reported discussed.
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