Electrical characterization of as-grown, annealed and indium-doped Hg1-xZnxTe for x near 0.15

作者: S. Rolland , A. Lasbley , A. Seyni , R. Granger , R. Triboulet

DOI: 10.1051/RPHYSAP:01989002408079500

关键词: Electrical resistivity and conductivityDopingHall effectBand gapAnnealing (metallurgy)Electron mobilitySemiconductorOptoelectronicsChemistryCondensed matter physicsIndium

摘要:

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