Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication

摘要: Block copolymers have garnered significant attention in the past few decades due to their ability self-assemble into nanoscale structures (∼10–100 nm), making them ideal for emerging nanotechnologies, such as nanolithography, nanotemplating, nanoporous membranes, and ultrahigh-density storage media. Many of these applications require thin film geometries, which block form well-ordered nanostructures and/or precisely controlled domain orientations. In this Perspective, we discuss recent progress toward techniques that achieve directed self-assembly copolymer films. Substrate prepatterning, nanoimprint lithography, molecular transfer printing, solvent treatment, zone processing approaches are highlighted. Finally, comment on developments high-throughput situ characterization methods, provide future research directions nanostructure refinement.