Eliminate release etch attack by interface modification in sacrificial layers

作者: David Heald , Chia Wei Yang , Chih-Wei Chiang , Evgeni Gousev , Qi Luo

DOI:

关键词: Structural engineeringSubstrate (printing)Materials scienceLayer (electronics)Composite material

摘要: Methods of making a micro electromechanical system (MEMS) device are described. In some embodiments, the method includes forming sacrificial layer over substrate, treating at least portion to form treated portion, an overlying part and partially removing cavity situated between substrate layer, being exposed cavity.

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