Methods and apparatus for reducing reflection from optical substrates

作者: B. Vincent McKoy , Peter D. Haaland

DOI:

关键词: Materials scienceOptoelectronicsInertPlasma-enhanced chemical vapor depositionCoatingFluoropolymerArgonOptical filterAnalytical chemistryFresnel equationsPhotodiode

摘要: A method of coating optical substrates with anti-reflection (AR) coatings is described. The thickness and composition the determined by minimizing product Fresnel reflection coefficients for a angular- wavelength-dependent sensitivity human visual system to minimize perceived reflectance coated article. compact chamber evacuated flushed chemically inert gas such as argon or nitrogen. One more molecular precursors are deposited using plasma enhanced chemical vapor deposition (PECVD) form AR films. Single-layer based on fluoropolymer films controlled thickness, well organic, organosilicon, and/or inorganic multilayers Also provided monitoring film growth optically, polarized, light-emitting diode, polarizing filter, photodiode. Feedback from monitor used control precursor flow produce single layers prescribed properties.