Platinum source compositions for chemical vapor deposition of platinum
作者： Thomas H. Baum , Sofia Pombrik , Peter S. Kirlin
DOI:
关键词: Deposition (phase transition) 、 Solvent 、 Substrate (chemistry) 、 Trimethylsilyl 、 Platinum 、 Chemistry 、 Reagent 、 Chemical vapor deposition 、 Inorganic chemistry 、 Trifluoromethyl
摘要: A platinum source reagent liquid solution, comprising: (i) at least one compound selected from the group consisting of compunds formulae: (A) RCpPt(IV)R'3 compounds, formula (I), wherein R is hydrogen, methyl, ethyl, i-propyl, n-propyl, n-butyl, i-butyl, t-butyl, trimethylsilyl and methyl; each R' idependently (B) Pt(β-diketonates)2 (II), independently trifluoromethyl, perfluoroethyl, perfluoro-n-propyl, (ii) a solvent medium therefor. The solutions invention are readily employed in chemical vapor deposition process system including delivery apparatus for volatilizing solution transporting resulting to reactor on substrate mounted CVD reactor.
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