Spectroscopic study of 50 Hz pulsed Ar–O2 mixture plasma

作者: M. Imran , N.U. Rehman , A.W. Khan , M. Zaka-ul-Islam , M. Shafiq

DOI: 10.1016/J.RADPHYSCHEM.2016.02.026

关键词: ActinometerAnalytical chemistryChemistryCurrent densityAtomic physicsDissociation (chemistry)Capacitively coupled plasmaExcitation temperatureRadiant intensityOxygenPlasma

摘要: Abstract Plasma sterilization is widely used to disinfect the heat sensitive materials. In this study, we have investigated 50 Hz pulsed capacitively coupled plasma (CCP) system operated in Ar–O2 mixture. Optical emission spectroscopy (OES) identify optimum conditions suitable for based sterilization. Explicitly, excitation temperature of Ar-I lines, atomic oxygen density, dissociation fraction and UV radiation intensity are measured as a function discharge parameters. The calculated using Boltzmann plot method whereas OES has also been employed evaluate ground state density fraction. Similarly normalized determined from spectrum 200–400 nm range. results show that total value at 20% oxygen, 2 mbar pressure 2.68 mA/cm2 current While temperature, increase with density. A comparison literature suggests CCP mixture potential cheap reliable

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