Strong white and blue photoluminescence from silicon nanocrystals in SiNx grown by remote PECVD using SiCl4/NH3
作者： A Benami , G Santana , A Ortiz , A Ponce , D Romeu
DOI: 10.1088/0957-4484/18/15/155704
关键词: Optoelectronics 、 Transmission electron microscopy 、 Remote plasma 、 Analytical chemistry 、 Chemical vapor deposition 、 Photoluminescence 、 Materials science 、 Potential well 、 Volumetric flow rate 、 Plasma-enhanced chemical vapor deposition 、 Passivation
摘要: Strong white and blue photoluminescence (PL) from as-grown silicon nanocrystals (nc-Si) in SiNx films prepared by remote plasma enhanced chemical vapour deposition using SiCl4/NH3 mixtures is reported. The colour intensity of the PL could be controlled adjusting NH3 flow rate. Samples with emission were annealed at 1000 °C, obtaining a strong improvement colour. can attributed to quantum confinement effect nc-Si embedded matrix, which improved when better passivation surface chlorine nitrogen atoms obtained. size, density structure confirmed measured high-resolution transmission electron microscopy.
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