作者: S. Domínguez-Meister , S. El Mrabet , R. Escobar-Galindo , A. Mariscal , M.C. Jiménez de Haro
DOI: 10.1016/J.APSUSC.2015.06.099
关键词: Oxide 、 Yttrium 、 Analytical chemistry 、 Materials science 、 Sputter deposition 、 Scanning electron microscope 、 Passivation 、 Metallurgy 、 Silicon 、 Coating 、 Sputtering
摘要: Abstract CrAlYN coatings with different aluminum (4–12 at.%) and yttrium (2–5 at.%) contents are deposited by d.c. reactive magnetron sputtering on silicon M2 steel substrates using metallic targets Ar/N2 mixtures. The influence of the nanostructure chemical elemental distribution oxidation resistance after heating in air at 1000 °C is studied means cross-sectional scanning electron microscopy (X-SEM), energy dispersive X-ray analysis (EDX), diffraction (XRD) glow discharge optical emission spectroscopy (GD-OES). sequential exposure to during synthesis leads a multilayer structure where concentration elements (Cr, Al Y) changing periodically. A good observed when Al- Y-rich regions separated well-defined CrN layers, maintaining crystalline coherence along columnar structure. This protective behavior independent type substrate corresponds formation thin mixed (Al, Cr)-oxide scale that protects film underneath. GD-OES XRD have demonstrated Y acts as element, blocking Fe C atoms diffusion from favoring higher Al/Cr ratio passivation layer heating. coating content around 4 at.% exhibited best performance thinner oxide scale, delay decomposition transformation Cr2N, more effective blocking.