作者: Jianlin Chen , Chenxi Guo , Jian Chen , Jianjun He , Yanjie Ren
DOI: 10.1016/J.MATLET.2014.06.159
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摘要: Abstract The microstructure, optical and electrical properties of CrAlN (Cr, Al) films synthesized by DC reactive magnetron sputtering method have been comparatively investigated. results show that film crystallizes in B1 NaCl-typed CrN structure with the preferred growth orientations (1 1 1) (2 2 0) grains perfectly crystalline pyramid-like shape. is determined as Al-doped phase chemical formula Cr 0.9136 Al 0.0864 N 0.8999 . It shows similar reflectance absorptance characteristics to those TiN based solar spectrum region (300–2600 nm) exhibits semiconductor nature a sheet resistance 38 kΩ/sq. Hence can be used novel candidate material for high-temperature selective absorber coatings good thermal stability oxidation resistance.