SiC fibre by chemical vapour deposition on tungsten filament
作者： R. V. Krishnarao , J. Subrahmanyam , S. Subbarao
DOI: 10.1007/BF02704921
关键词: Chemical vapor deposition 、 Hydrogen 、 Tungsten 、 Volumetric flow rate 、 Deposition (law) 、 Coating 、 Substrate (chemistry) 、 Silane 、 Materials science 、 Composite material
摘要: A CVD system for the production of continuous SiC fibre was set up. The process coating on 19 µ m diameter tungsten substrate studied. Methyl trichloro silane (CH3SiCl3) and hydrogen reactants were used. Effect temperature (1300–1500°C) concentration formation coatings negligible thickness formed at very low flow rates (5 × 10−5 m3/min) CH3SiCl3 (1.0 10−4 m3/min Ar). Uneven brittle fibres atvery high concentrations (6 adjusted to get with smooth surface. structure morphology evaluated.
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