High Efficiency Shallow p+nn+ Cadmium Telluride Solar Cells

作者: G. Cohen-Solal , D. Lincot , M. Barbe

DOI: 10.1007/978-94-009-7898-0_102

关键词: DopingCoatingOptoelectronicsLayer (electronics)Degradation (geology)EpitaxySolar cell efficiencyQuantum efficiencyChemistryCadmium telluride photovoltaics

摘要: Significant improvements have been achieved in preparing CdTe shallow homojunctions with conversion efficiencies over 11% AM1 (higher than 13% proper A.R. coating). The cells are fabricated by using a close spaced vapor transport (C.S.V.T.) technique to form p-type epitaxial layer upon single crystal substrate (n-type CdTe). combined use of doping gradient the n-base material, heavily p doped on front and an optimization junction deepness lead p+nn+ structures reproducible way. best performance parameters Voc∼0,85 Volt, Isc∼20 mA/cm2 F.F.∼70%. shown no degradation after 18 months.

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