作者: G. Cohen-Solal , D. Lincot , M. Barbe
DOI: 10.1007/978-94-009-7898-0_102
关键词: Doping 、 Coating 、 Optoelectronics 、 Layer (electronics) 、 Degradation (geology) 、 Epitaxy 、 Solar cell efficiency 、 Quantum efficiency 、 Chemistry 、 Cadmium telluride photovoltaics
摘要: Significant improvements have been achieved in preparing CdTe shallow homojunctions with conversion efficiencies over 11% AM1 (higher than 13% proper A.R. coating). The cells are fabricated by using a close spaced vapor transport (C.S.V.T.) technique to form p-type epitaxial layer upon single crystal substrate (n-type CdTe). combined use of doping gradient the n-base material, heavily p doped on front and an optimization junction deepness lead p+nn+ structures reproducible way. best performance parameters Voc∼0,85 Volt, Isc∼20 mA/cm2 F.F.∼70%. shown no degradation after 18 months.