Thermal stability of RuO 2 , Ba x Sr 1− x TiO 3 /RuO 2 , and Ba x Sr 1− x TiO 3 /Pt/Ti/SiO 2 on Si(100)

作者: T. S. Kang , Y. S. Kim , Jung Ho Je

DOI: 10.1557/JMR.2000.0282

关键词: Materials scienceAmorphous solidOxideThermal stabilitySiliconAnalytical chemistryThin filmAnnealing (metallurgy)CrystallizationAlloy

摘要: The thermal stability of RuO 2 /Si(100) films in air was studied using ex situ synchrotron x-ray scattering. (110) textured film showed good due to the low surface and strain energies. However, high energies were transformed three-dimensional islands during annealing up 800 °C. We also studied, post process, interface roughness Ba x Sr 1− TiO 3 (BST)/RuO BST/Pt/Ti/SiO structures comparatively, interfaces BST/RuO /Si thermally stable 500 °C, deterioration above °C attributed crystallization amorphous BST film. Meanwhile, significantly degraded even at temperature 350 mainly formation Pt–Ti alloy Ti oxidation.

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