Cigs nanoparticle ink formulation having a high crack-free limit
作者： Zugang Liu , Christopher Newman
DOI:
关键词: Copper indium gallium selenide solar cells 、 Chemical engineering 、 Dissolution 、 Annealing (metallurgy) 、 Crack free 、 Nanotechnology 、 Organic component 、 Materials science 、 Thin film 、 Inkwell 、 Nanoparticle
摘要: A method for formulating a CIGS nanoparticle-based ink, which can be processed to form thin film with crack-free limit (CFL) of 500 nm or greater, comprises: dissolving dispersing Cu(ln,Ga)S2 and Cu(ln,Ga)Se2 nanoparticles; mixing the nanoparticle solutions/dispersions adding oleic acid an ink; depositing ink on substrate; annealing remove organic components formulation; forming CFL ≥ nm; and, repeating deposition process having thickness 1 μιη. The so produced may incorporated into photovoltaic device.
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