Characterization of the performance and failure mechanisms of boron-doped ultrananocrystalline diamond electrodes
作者： Brian P. Chaplin , Ian Wyle , Hongjun Zeng , John A. Carlisle , James Farrell
DOI: 10.1007/S10800-011-0351-7
关键词: Electrochemistry 、 Anode 、 Materials science 、 Electrode 、 Current density 、 Diamond 、 Substrate (electronics) 、 Composite material 、 Oxide 、 Delamination
摘要: This research investigated the anodic stability of boron-doped ultrananocrystalline diamond (BD-UNCD) film electrodes on a variety substrates (Si, Ta, Nb, W, and Ti) at current density 1 A cm -2 . At an applied charge 100 h , measurable BD-UNCD wear was not observed using SEM cross-sectional measure- ments. However, treatment resul- ted in surface oxidation delamination, which caused substantial changes to electrochemical proper- ties electrodes. The substrate roughness, electroactivity, compactness oxide were key parameters that affected adhesion, primary mechanism electrode failure delamination film. Substrate materials whose oxides had larger coefficient thermal expansion relative reduced metal resulted delamination. approximate followed order of: Ta ( Si Nb WTi.
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