作者: J.Y. Chen , W.-L. Chang , C.K. Huang , K.W. Sun
DOI: 10.1364/OE.19.014411
关键词: Materials science 、 Coating 、 Thin film 、 Crystalline silicon 、 Optics 、 Nanoimprint lithography 、 Solar cell efficiency 、 Solar cell 、 Silicon 、 Photovoltaic system
摘要: In this report, we demonstrate the implementation of biomimetic nanostructured antireflection coatings with polymethyl methacrylate (PMMA) layer on micro-textured surface silicon crystalline solar cells. To reduce cost, process combines colloidal lithography, cast molding method, and reversal nanoimprint lithography. The technique is simple, low does not cause damage to thin brittle conventional properties nanostructure coating are considered as effective those a single-layer SiNx film. resultant structures alone could average reflectance cell from 13.2% 7.8% enhance power conversion efficiency 12.85% 14.2%.