Observation and simulation of focused ion beam induced damage

作者: C. Vieu , G. Ben Assayag , J. Gierak

DOI: 10.1016/0168-583X(94)95632-4

关键词: Current (fluid)AsymmetryChemistryFocused ion beamIon sourceAtomic physicsTransmission electron microscopyAmorphous solidCharacterization (materials science)Ion

摘要: Abstract Theoretical calculations of focused ion beam implantation induced damage are compared to cross-sectional transmission electron microscopy observations amorphous zones. The calculation takes into account a depth dependent lateral straggling the defect distribution and arbitrary current distributions within spot including asymmetry tails. At high emission source, an expression profile involving two Gaussians describe core tails probe was found fit perfectly experimental features. potential application this procedure for characterization spots is discussed.

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