THE INFLUENCE OF THE ION INDUCED SECONDARY ELECTRON EMISSION ON THE CHARACTERISTICS OF RF PLASMAS
作者： M Radmilovic-Radjenovic , A. Bojarov , Z. Lj. Petrovic
DOI:
关键词: Atomic physics 、 Plasma 、 Metal 、 Secondary emission 、 Capacitively coupled plasma 、 Chemistry 、 Ion
摘要: In this paper the effect of secondary emission on characteristics rf plasmas has been studied. Calculations were performed for a dual-frequency capacitively coupled plasma reactor by using 1d3v PIC/MCC code. model, energy depen- dence yields per ion, differently treated metal surfaces have implemented. The obtained simulation results indicate that are greatly affected processes.
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aob.rs 参考文章(1)
Toshiaki Makabe, Zoran Lj. Petrovic, Plasma Electronics: Applications in Microelectronic Device Fabrication ,(2006)