Effect of Annealing on the Optical and Chemical Bonding Properties of Hydrogenated Amorphous Carbon and Hydrogenated Amorphous Carbon Nitride Thin Films
作者： Richard Ritikos , Chow Chee Siong , Siti Meriam Ab. Gani , Muhamad Rasat Muhamad , Saadah Abdul Rahman
关键词: Amorphous carbon 、 Nitride 、 Analytical chemistry 、 Chemical vapor deposition 、 Amorphous solid 、 Thin film 、 Hydrogen 、 Annealing (metallurgy) 、 Carbon film 、 Materials science 、 General Engineering 、 General Physics and Astronomy
摘要: Hydrogenated amorphous carbon (a-C:H) and hydrogenated nitride (a-CNx:H) films were prepared in a custom-built radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) system with parallel-plate configuration. Pure methane gas mixture of nitrogen used as sources to obtain these films. The characterized using Fourier transform infrared optical transmission spectroscopy techniques. incorporation the effect annealing (100–500 °C) on film properties studied. determined be thermally stable up 300 °C. Upon above °C, thickness refractive index both a-C:H a-CNx:H increase while energy gap E04 decreases. These effects more pronounced a-CNx:H. From IR spectra, changes are considered due decreases hydrogen concentrations which result their structural modification.
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