Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering

作者: Z.H. Huang , B. Yang , C.S. Liu , L.P. Guo , X.J. Fan

DOI: 10.1016/J.MATLET.2006.11.127

关键词:

摘要: Abstract Carbon nitride films were deposited by middle-frequency reactive magnetron sputtering and annealed at different temperatures in nitrogen ambient. X-ray photoelectron spectroscopy, Raman scattering, transmission electron microscopy, nano-indenter used to characterize the as-deposited films. The analysis showed that annealing resulted dissociation of N C happened after 500 °C lagged behind N. With increase temperature, disorder sp 2 decreased gradually graphitized. microstructure changed from amorphous fullerene-like CN x with temperature increasing 500 °C, then nitridized graphite nanocrystals 600 °C. graphitization a drastic decreasing hardness modulus

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