What happens in the annealing of carbon nitride thin films

摘要: Carbon nitride (CNx) thin films about 35 nm thick, prepared by radio-frequency magnetron sputtering at different substrate temperatures, were annealed 800 °C for 40 min in a vacuum. X-ray photoelectron spectroscopy, Raman and grazing incidence x-ray reflectivity used to investigate the annealing effects on composition structure of CNx films. An atomic force microscope equipped with diamond tip was measure hardness Obvious changes film thickness observed. The room temperature decreased 1.2 increased 3.9 nm, respectively, after annealing, but 300 °C did not change. dropped from more than 30 GPa almost half thermal treatment. However, nitrogen concentration density only slightly. These results can be explained desorption volatile phases graphit...