Direct imprinting of organic---inorganic hybrid materials into high aspect ratio sub-100 nm structures
作者： Victor J Cadarso , Thomas Kiefer , V Auzelyte , H Atasoy , Gabi Gruetzner
DOI: 10.1007/S00542-013-2016-4
关键词:
摘要: The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithography (NIL) is addressed in this work. Thermal shrinkage induced cooling the below room temperature to avoid issues commonly arising during release polymeric nanostructures from master. UV-NIL has been performed obtain OrmoComp® using OrmoStamp® working stamps copied Si masters. Nanoridges and nanopillars 45 nm width 380 thickness have fabricated a corresponding 8.5. This is, best our knowledge, highest achieved organic---inorganic hybrid materials at scale.
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