Multiple select gate architecture

作者: Seiichi Aritome

DOI:

关键词: Footprint (electronics)Electronic engineeringArchitectureEngineeringSizingFeature (computer vision)Bit lineComputer hardware

摘要: Non-volatile memory devices including multiple series-coupled select gates on the drain and/or source ends of strings non-volatile cells. By utilizing gates, each gate can be made using smaller features sizes while achieving same level protection against GIDL and other forms current leakage. reducing feature size footprint cells reduced, thereby facilitating device sizing. Further reductions in sizing may achieved a staggered self-aligned bit line contact configuration.

参考文章(16)
Hiroshi Nakamura, Koichi Kawai, Kenichi Imamiya, Semiconductor storage device having page copying function ,(2005)
D.J. Kim, J.D. Choi, J. Kim, H.K. Oh, S.T. Ahn, O.H. Kwon, Process integration for the high speed NAND flash memory cell symposium on vlsi technology. pp. 236- 237 ,(1996) , 10.1109/VLSIT.1996.507868
Jin-Man Han, Benjamin Louie, Flash memory programming to reduce program disturb ,(2007)
Shoichi Kawamura, Mike Van Buskirk, Sameer Haddad, Paul-Ling Chen, Chung-You Hu, Shane Charles Hollmer, Chi Chang, Yu Sun, Binh Quang Le, Dual source side polysilicon select gate structure and programming method utilizing single tunnel oxide for nand array flash memory ,(1999)