Relations between the optical properties and the microstructure of TiO2 thin films prepared by ion-assisted deposition
作者： Y Leprince-Wang , D Souche , K Yu-Zhang , S Fisson , G Vuye
DOI: 10.1016/S0040-6090(99)00759-2
关键词: Transmission electron microscopy 、 Ion 、 Refractive index 、 Optics 、 Thin film 、 Materials science 、 Microstructure 、 Analytical chemistry 、 Molar absorptivity 、 Ellipsometry 、 Evaporation
摘要: Abstract Oxygen ion-assisted TiO 2 thin films have been studied by in situ visible spectroscopic ellipsometry (SE) and transmission electron microscopy (TEM). Influence of the substrate nature temperature, ion kinetic energy E c ion/molecule ratio Φ i / at was investigated on microstructure optical properties films. It is revealed that refractive index n varies as a function average per molecule, d = ( ). Conditions for obtaining dense with high (n ~ 2.60 λ =0.45 μm) low extinction coefficient k found > dth ~50 eV). These are insensitive to moisture adsorption surface roughness. Cross-sectional TEM has mainly used observation phase identification prepared under different evaporation conditions. Comparison done relationship property measurements.
harvard.edu
elsevier.com
sci-hub.se 参考文章(11)
M Gilo, N Croitoru, Properties of TiO2 films prepared by ion-assisted deposition using a gridless end-Hall ion source Thin Solid Films. ,vol. 283, pp. 84- 89 ,(1996) , 10.1016/0040-6090(95)08500-9
D. Souche, A. Brunet-Bruneau, S. Fisson, V. Nguyen Van, G. Vuye, F. Abeles, J. Rivory, Visible and infrared ellipsometry study of ion assisted SiO2 films Thin Solid Films. ,vol. 313, pp. 676- 681 ,(1998) , 10.1016/S0040-6090(97)00976-0
M. Lottiaux, C. Boulesteix, G. Nihoul, F. Varnier, F. Flory, R. Galindo, E. Pelletier, Morphology and structure of TiO2 thin layers vs. thickness and substrate temperature Thin Solid Films. ,vol. 170, pp. 107- 126 ,(1989) , 10.1016/0040-6090(89)90627-5
F. Adibi, I. Petrov, J. E. Greene, L. Hultman, J.‐E. Sundgren, Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering Journal of Applied Physics. ,vol. 73, pp. 8580- 8589 ,(1993) , 10.1063/1.353388
I. Petrov, F. Adibi, J. E. Greene, L. Hultman, J.‐E. Sundgren, Average energy deposited per atom: A universal parameter for describing ion‐assisted film growth? Applied Physics Letters. ,vol. 63, pp. 36- 38 ,(1993) , 10.1063/1.109742
C.R Ottermann, K Bange, Correlation between the density of TiO2 films and their properties Thin Solid Films. ,vol. 286, pp. 32- 34 ,(1996) , 10.1016/S0040-6090(96)08848-7
M. Laube, F. Rauch, C. Ottermann, O. Anderson, K. Bange, Density of thin TiO2 films Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 113, pp. 288- 292 ,(1996) , 10.1016/0168-583X(95)01331-8
Jean M. Bennett, Emile Pelletier, G. Albrand, J. P. Borgogno, B. Lazarides, Charles K. Carniglia, R. A. Schmell, Thomas H. Allen, Trudy Tuttle-Hart, Karl H. Guenther, Andreas Saxer, Comparison of the properties of titanium dioxide films prepared by various techniques. Applied Optics. ,vol. 28, pp. 3303- 3317 ,(1989) , 10.1364/AO.28.003303
J Ayache, P.H Albarède, Application of the ionless tripod polisher to the preparation of YBCO superconducting multilayer and bulk ceramics thin films Ultramicroscopy. ,vol. 60, pp. 195- 206 ,(1995) , 10.1016/0304-3991(95)00073-8
Y. Leprince-Wang, K. Yu-Zhang, V. Nguyen Van, D. Souche, J. Rivory, Correlation between microstructure and the optical properties of TiO2 thin films prepared on different substrates Thin Solid Films. ,vol. 307, pp. 38- 42 ,(1997) , 10.1016/S0040-6090(97)00293-9