Deposition and characterisation of functional ITO thin films
作者： Gaël Giusti
DOI:
关键词: Oxide 、 Substrate (electronics) 、 Materials science 、 Dye-sensitized solar cell 、 Microstructure 、 Deposition (phase transition) 、 Chemical engineering 、 Borosilicate glass 、 Nanotechnology 、 Pulsed laser deposition 、 Thin film
摘要: Polycrystalline tin-doped indium oxide (ITO) thin films were prepared by Pulsed Laser Deposition (PLD) with an ITO (In\(_2\)O\(_3\)-10 wt.% SnO\(_2\)) target and deposited on borosilicate glass substrates. By changing independently the thickness, deposition temperature oxygen pressure, a variety of microstructures deposited. The impact film physical properties different gas dynamics is stressed explained. Films at room (RT) show poorer opto-electrical properties. same true for low or high pressure. It shown that grown 1 to 10 mT Oxygen pressure 200 °C best compromise in terms transmittance resistivity. influence substrate microstructure discussed. A practical application (a Dye Sensitized Solar Cell) proposed.
bl.uk参考文章(106)
Greg P. Smestad, Education and solar conversion:: Demonstrating electron transfer Solar Energy Materials and Solar Cells. ,vol. 55, pp. 157- 178 ,(1998) , 10.1016/S0927-0248(98)00056-7
I. P. Jones, Chemical microanalysis using electron beams Institute of Materials. ,(1992)
Sea‐Way Jan, Si‐Chen Lee, Preparation and Characterization of Indium‐Tin‐Oxide Deposited by Direct Thermal Evaporation of Metal Indium and Tin Journal of The Electrochemical Society. ,vol. 134, pp. 2056- 2061 ,(1987) , 10.1149/1.2100819
Andreea Trache, Gerald A. Meininger, Atomic force microscopy (AFM). Current protocols in microbiology. ,vol. 8, ,(2008) , 10.1002/9780471729259.MC02C02S8
Milton Ohring, The Materials Science of Thin Films ,(1991)
L. Reimer, M. Wächter, Contribution to the contamination problem in transmission electron microscopy. Ultramicroscopy. ,vol. 3, pp. 169- 174 ,(1978) , 10.1016/S0304-3991(78)80023-0
C. Coutal, A. Azéma, J.-C. Roustan, Fabrication and characterization of ITO thin films deposited by excimer laser evaporation Thin Solid Films. ,vol. 288, pp. 248- 253 ,(1996) , 10.1016/S0040-6090(96)08824-4
J M Marshall, Carrier diffusion in amorphous semiconductors Reports on Progress in Physics. ,vol. 46, pp. 1235- 1282 ,(1983) , 10.1088/0034-4885/46/10/002
Makoto Shiojiri, Toshio Miyano, Chihiro Kaito, Electron Microscopic Studies of Structure and Crystallization of Amorphous Metal Oxide Films Japanese Journal of Applied Physics. ,vol. 18, pp. 1937- 1945 ,(1979) , 10.1143/JJAP.18.1937
J. P. Zheng, Z. Q. Huang, D. T. Shaw, H. S. Kwok, Generation of high‐energy atomic beams in laser‐superconducting target interactions Applied Physics Letters. ,vol. 54, pp. 280- 282 ,(1989) , 10.1063/1.101553