Monte Carlo simulation of phase separation during thin‐film codeposition

作者: C. D. Adams , D. J. Srolovitz , M. Atzmon

DOI: 10.1063/1.354825

关键词:

摘要: The results of Monte Carlo simulation phase separation during binary film coevaporation are presented for a range deposition conditions. model employed assumes that occurs through surface interdiffusion deposition, while the bulk remains frozen. Simulations were performed on A‐B alloy films having compositions 10 and 50 vol % solute. For both compositions, lateral scale domains at evolves to steady‐state size deposition. A power‐law dependence domain inverse rate is obtained. Simulation microstructures compare favorably with those obtained in previous experimental study Al‐Ge same composition. Results simulations compared predictions theoretical based above assumptions. exponent from different than t...

参考文章(17)
Joel Louis Lebowitz, Cyril Domb, Melville S. Green, Phase Transitions and Critical Phenomena ,(1972)
Kenneth E. Easterling, David A. Porter, Phase transformations in metals and alloys ,(1981)
John A. Thornton, Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings Journal of Vacuum Science and Technology. ,vol. 12, pp. 830- 835 ,(1975) , 10.1116/1.568682
S. Ling, M. P. Anderson, Development and evolution of thin film microstructures: a Monte Carlo approach Journal of Electronic Materials. ,vol. 17, pp. 459- 466 ,(1988) , 10.1007/BF02652133
I.M. Lifshitz, V.V. Slyozov, The kinetics of precipitation from supersaturated solid solutions Journal of Physics and Chemistry of Solids. ,vol. 19, pp. 35- 50 ,(1961) , 10.1016/0022-3697(61)90054-3
Gary S. Grest, David J. Srolovitz, Structure and evolution of quenched Ising clusters Physical Review B. ,vol. 30, pp. 5150- 5155 ,(1984) , 10.1103/PHYSREVB.30.5150
D. J. Srolovitz, A. Mazor, B. G. Bukiet, Analytical and numerical modeling of columnar evolution in thin films Journal of Vacuum Science and Technology. ,vol. 6, pp. 2371- 2380 ,(1988) , 10.1116/1.575558
John A. Thornton, Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings Journal of Vacuum Science and Technology. ,vol. 11, pp. 666- 670 ,(1974) , 10.1116/1.1312732
Paul G. Shewmon, Diffusion in solids ,(1963)
J.W Cahn, The kinetics of cellular segregation reactions Acta Metallurgica. ,vol. 7, pp. 18- 28 ,(1959) , 10.1016/0001-6160(59)90164-6