Photorefractive effects in LiNbO3:Fe under external electric fields
作者： R. Orlowski , E. Krätzig , H. Kurz
DOI: 10.1016/0030-4018(77)90187-0
关键词:
摘要: Abstract The photorefractive properties of LiNbO 3 :Fe crystals are studied in the near uv-region under influence externally applied electric fields. Improvements sensitivity have been obtained oxidized samples showing large dark storage times.
harvard.edu
elsevier.com
sci-hub.se 参考文章(8)
F. S. Chen, J. T. LaMacchia, D. B. Fraser, HOLOGRAPHIC STORAGE IN LITHIUM NIOBATE Applied Physics Letters. ,vol. 13, pp. 223- 225 ,(1968) , 10.1063/1.1652580
J.P. Huignard, F. Micheron, Control of sensitivity to hologram storage in LiNbO3 using an accessory photovoltaic crystal Optics Communications. ,vol. 16, pp. 80- 82 ,(1976) , 10.1016/0030-4018(76)90055-9
E. Kratzig, H. Kurz, Spectral dependence of the photorefractive recording and erasure process in doped LiNbO3 Ferroelectrics. ,vol. 10, pp. 159- 162 ,(1976) , 10.1080/00150197608241970
Y. Ohmori, Y. Yasojima, Y. Inuishi, Control of optical damage in reduced LiNbO3 by external applied field Applied Physics Letters. ,vol. 25, pp. 716- 717 ,(1974) , 10.1063/1.1655373
W. D. Cornish, M. G. Moharam, L. Young, Effects of applied voltage on hologram writing in lithium niobate Journal of Applied Physics. ,vol. 47, pp. 1479- 1484 ,(1976) , 10.1063/1.322812
Naoya Uchida, Calculation of diffraction efficiency in hologram gratings attenuated along the direction perpendicular to the grating vector Journal of the Optical Society of America. ,vol. 63, pp. 280- 287 ,(1973) , 10.1364/JOSA.63.000280
A. M. Glass, D. von der Linde, T. J. Negran, High‐voltage bulk photovoltaic effect and the photorefractive process in LiNbO3 Applied Physics Letters. ,vol. 25, pp. 233- 235 ,(1974) , 10.1063/1.1655453
Herwig Kogelnik, Coupled Wave Theory for Thick Hologram Gratings Bell System Technical Journal. ,vol. 48, pp. 2909- 2947 ,(1969) , 10.1002/J.1538-7305.1969.TB01198.X