Nucleation and growth of ion beam sputtered metal films

摘要: Transmission electron microscope observations have been made on ion beam sputtered (IBS) films of Cu, Au, Pt and Ni (of predetermined thicknesst′ ⩾ 0.5 nm) deposited amorphous carbon substrates. The influence IBS parameters particle size distribution deposition rate has measured, also the fractional substrate coveragef as a function oft′ which indicates three-dimensional island growth in Cu two-dimensional Pt, films. Electron diffraction measurements appear to show that f.c.c. metal particles grow with (1 1 0) parallel with, case Ni, critical thickness ∼ 0.8 nm.