Picosecond laser system with a wavelength of 193nm based on a solid-state Nd:YAG laser, parametric oscillator, and ArF amplifier

作者: S. P. Sadovskii , P. A. Chizhov , V. V. Bukin , V. M. Brendel , T. V. Dolmatov

DOI: 10.3103/S1541308X14040025

关键词:

摘要: Powerful picosecond UV pulses at a wavelength of 193nm are produced using Nd:YAG laser radiating with subsequent nonlinear transformations the radiation and amplification in an excimer gain medium to energy 10 mJ.

参考文章(8)
I. V. Tomov, T. Anderson, P. M. Rentzepis, High repetition rate picosecond laser system at 1983 nm Applied Physics Letters. ,vol. 61, pp. 1157- 1159 ,(1992) , 10.1063/1.107631
H. Pummer, H. Egger, T. S. Luk, T. Srinivasan, C. K. Rhodes, Vacuum-ultraviolet stimulated emission from two-photon-excited molecular hydrogen Physical Review A. ,vol. 28, pp. 795- 801 ,(1983) , 10.1103/PHYSREVA.28.795
Kasem Mossavi, Thomas Hofmann, FK Tittel, G Szabo, Ultrahigh-brightness, femtosecond ArF excimer laser system Applied Physics Letters. ,vol. 62, pp. 1203- 1205 ,(1993) , 10.1063/1.108734
T. Kasamatsu, M. Tsunekane, H. Sekita, Y. Morishige, S. Kishida, 1 pm spectrally narrowed ArF excimer laser injection locked by fourth harmonic seed source of 773.6 nm Ti:sapphire laser Applied Physics Letters. ,vol. 67, pp. 3396- 3398 ,(1995) , 10.1063/1.114905
Detlef Günther, Christoph A. Heinrich, Comparison of the ablation behaviour of 266 nm Nd:YAG and 193 nm ArF excimer lasers for LA-ICP-MS analysis J. Anal. At. Spectrom.. ,vol. 14, pp. 1369- 1374 ,(1999) , 10.1039/A901649J
R. Haight, J. Bokor, J. Stark, R. H. Storz, R. R. Freeman, P. H. Bucksbaum, Picosecond time-resolved photoemission study of the InP(110) surface. Physical Review Letters. ,vol. 54, pp. 1302- 1305 ,(1985) , 10.1103/PHYSREVLETT.54.1302
Ingo Horn, Detlef Günther, Marcel Guillong, Evaluation and design of a solid-state 193 nm OPO-Nd:YAG laser ablation system Spectrochimica Acta Part B: Atomic Spectroscopy. ,vol. 58, pp. 1837- 1846 ,(2003) , 10.1016/S0584-8547(03)00163-0
Hikaru Kouta, Yasuhiko Kuwano, Attaining 186-nm light generation in cooled ?-BaB_2O_4 crystal Optics Letters. ,vol. 24, pp. 1230- 1232 ,(1999) , 10.1364/OL.24.001230